Nikon, A*STAR Institute to set up joint R&D lab in Singapore

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Nikon Corp and A*STAR Institute of Microelectronics (IME), a leading semiconductor research institute of Singapore, have announced a collaboration with an agreement to jointly set up a research and development (R&D) laboratory to develop advanced optical lithography technology used in the manufacturing of semiconductor chips.

Nikon and IME will collaborate on technologies such as multiple patterning and direct self assembly techniques to drive the extension of ArF Deep Ultraviolet (DUV) dry and immersion lithography down to geometry of 20 nm and beyond, targeting advanced applications including logic, high density memory, embedded non-volatile memory, high-speed electronics and nanophotonics, and nano-electromechanical systems(NEMS).

Nikon said the collaboration will allow it to tap into IME’s advanced R&D infrastructure, process technology and talent pool to get early insights into its next-generation systems, which will shorten time-to-market. It will open opportunities to Nikon to learn required technology for future processes, and continue to pushing ArF immersion lithography for several device nodes.

The new capabilities will enhance and expand IME’s joint collaborations with industry partners, research institutes and universities to develop advanced technologies such as metrology and materials for further technology shrinkage as well as manufacturing excellence.